
Right: Tetsuo Kikuchi
Senior Supervisor, Electronic Device Department, R&D Division,
Olympus Imaging Corporation
Left: Takeshi Kindaichi
Team Leader, Electronic Device Department, R&D Division,
Olympus Imaging Corporation
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"Development of the AF for the E-1 successor started with no
preconceptions about what type of AF technology was most suitable,"
explained Mr. Tetsuo Kikuchi of the Electronic Device Department,
almost shyly.
"Is the answer to extend the TTL phase error detection system that is
currently the most common AF system? Isn't there any other AF system
that can manifest the highest performance under any situation?
"With these questions in mind, we decided to throw out any existing
concepts and literally start over again from scratch.
"We worked in collaboration with a team from the Corporate R&D
Center in Utsugi, Hachioji. After studying every conceivable AF method,
we concluded that, 'The TTL phase error detection is the most suitable
for achieving fast, high-accuracy AF with digital SLR'."

"We began by identifying the ideal positions for the distance-sensing
points by statistically analyzing the positions of the main subjects in
thousands of pictures taken by professional photographers. We also
consulted with numerous professionals.
"We believe that the distance-sensing point layout we came up with is
the best.
In addition, we also added various new technologies to the new AF
sensor to improve performance at all the distance-sensing points,
including those in the peripheral area."
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